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[[:Category:Fachmodul|Fachmodul]]<br/> | [[:Category:Fachmodul|Fachmodul]]<br/> | ||
Photography and the Machine<br /> | Photography and the Machine<br /> | ||
''Instructor:'' [[Jesús Velázquez | ''Instructor:'' [[Jesús Velázquez https://www.uni-weimar.de/de/kunst-und-gestaltung/struktur/lehrgebiete-personen/medienkunstmediengestaltung/jesus-velazquez/]]<br/> | ||
''Credits:'' 6 [[ECTS]], 4 [[SWS]]<br/> | ''Credits:'' 6 [[ECTS]], 4 [[SWS]]<br/> | ||
''Capacity:'' max. 10 students<br/> | ''Capacity:'' max. 10 students<br/> | ||
Revision as of 11:05, 19 May 2020
Fachmodul
Photography and the Machine
Instructor: Jesús Velázquez https://www.uni-weimar.de/de/kunst-und-gestaltung/struktur/lehrgebiete-personen/medienkunstmediengestaltung/jesus-velazquez/
Credits: 6 ECTS, 4 SWS
Capacity: max. 10 students
Language: English
Date: Montag/Monday, 13:30-16:45
Location: Online
First Meeting: 11 May 2020
BISON Course ID: 320110028
Description
In the last years we have seen major changes in the way we experience, consume, produce and think of Photography.
From algorithms affecting how your selfie looks on the fly, instant filters or digital tools for editing in a couple of taps on a screen to reproducing 3D objects and places with 2D based media.
Students in this course will explore different artistic strategies, bridging technologies and topics such as photogrammetry, machine learning, computational photography, image recognition and generation, etc. in order to develop new narratives and strategies in Photography.
Admission requirements
Concurrent enrollment in another IFD course offering, or with instructor permission.
Registration Procedure
In addition to the enrollment via the BISON portal, candidates are required to send a PDF portfolio including one page motivation letter, stating your interest for the course, current competences and background at: jesus.velazquez.rodriguez[ät]uni-weimar[dot]de
Evaluation
Successful completion of the course is dependent on regular attendance, active participation, completion of assignments, delivery of a relevant semester prototype and documentation. Please refer to the Evaluation Rubric for more details.
Eligible participants
Fachmodul:
MFA Medienkunst/-gestaltung, MFA Media Art and Design, MSc MediaArchitecture
Platforms and Tools
Primary Synchronous Conferencing:
Cisco Webex
Contingency Synchronous Conferencing:
Jitsi
Zoom
Syllabus (subject to change)
11 May 2020 / Week 1
Introduction
Course Organization
Administrative Housekeeping
18 May 2020 / Week 2
GANs in Art
Other (computer) approaches
Sources and Links from the Lecture