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From algorithms affecting how your selfie looks on the fly, instant filters or digital tools for editing in a couple of taps on a screen to reproducing 3D objects and places with 2D based media. | From algorithms affecting how your selfie looks on the fly, instant filters or digital tools for editing in a couple of taps on a screen to reproducing 3D objects and places with 2D based media. | ||
Students in this course will explore different artistic strategies bridging technologies and topics such | Students in this course will explore different artistic strategies bridging technologies and topics such as photogrammetry, machine learning, computational photography, image recognition and generation, etc. in order to develop new narratives and strategies in Photography. | ||
==Admission requirements== | ==Admission requirements== | ||
Revision as of 12:37, 22 April 2020
Fachmodul
Photography and the Machine
Instructor: Jesús Velázquez
Credits: 6 ECTS, 4 SWS
Capacity: max. 10 students
Language: English
Date: Montag/Monday, 13:30-16:45
Location: Online
First Meeting: 11 May 2020
Description
In the last years we have seen major changes in the way we experience, consume, produce and think of Photography.
From algorithms affecting how your selfie looks on the fly, instant filters or digital tools for editing in a couple of taps on a screen to reproducing 3D objects and places with 2D based media.
Students in this course will explore different artistic strategies bridging technologies and topics such as photogrammetry, machine learning, computational photography, image recognition and generation, etc. in order to develop new narratives and strategies in Photography.
Admission requirements
Concurrent enrollment in another IFD course offering, or with instructor permission.
Registration Procedure
In addition to the enrollment via the BISON portal, candidates are required to send a PDF portfolio including one page motivation letter, stating your interest for the course, current competences and background at: jesus.velazquez.rodriguez[ät]uni-weimar[dot]de
Evaluation
Successful completion of the course is dependent on regular attendance, active participation, completion of assignments, delivery of a relevant semester prototype and documentation. Please refer to the Evaluation Rubric for more details.
Eligible participants
Fachmodul:
MFA Medienkunst/-gestaltung, MFA Media Art and Design, MSc MediaArchitecture